February 13, 2013 | Written by: IBM Research Editorial Staff
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Today’s processors owe advancement to chemically amplified photoresists.
|C. Grant Willson
Chemically Amplified Resists – “materials used in lithography to form the structures in today’s semiconductor devices” – developed at IBM’s research lab in San Jose in the early 1980s (the lab since moved to Almaden, CA in 1986) by professors C. Grant Willson (who was working at IBM Research at the time, and earned the rank of IBM Fellow for this work), and Jean M. J. Fréchet, who joined the team while on sabbatical from the University of Ottawa, and the late IBM Fellow Dr. Hiroshi Ito, earned the 2013 Japan Prize.