relative MIP gap before starting to polish a feasible solution
Sets a relative MIP gap after which CPLEX starts to polish a feasible solution
Purpose
Relative MIP gap before starting to polish a solution
| API | Parameter Name | Name prior to V12.6.0 |
|---|---|---|
| C | CPXPARAM_MIP_PolishAfter_MIPGap | CPX_PARAM_POLISHAFTEREPGAP |
| C++ | IloCplex::Param::MIP::PolishAfter::MIPGap | PolishAfterEpGap (double) |
| OPL | polishafterepgap | |
| Interactive | mip polishafter mipgap | mip polishafter mipgap |
| Identifier | 2127 | 2127 |
Description
Sets a relative MIP gap after which CPLEX will stop branch-and-cut and begin polishing a feasible solution. The default value (0.0) is such that CPLEX does not invoke solution polishing by default. The relative MIP gap is calculated like this:
|bestbound-bestinteger|/(1e-10+|bestinteger|)
Starting conditions
CPLEX must have a feasible solution in order to start polishing. It must also have certain internal structures in place to support solution polishing. Consequently, when the criterion specified by this parameter is met, CPLEX begins solution polishing only after these starting conditions are also met. That is, there may be a delay between the moment when the criterion specified by this parameter is met and when solution polishing starts.
Values
Any number from 0.0 to 1.0, inclusive; default: 0.0.
See also