Using DELETE with MASK for Dependent Cluster Objects

Consider the following when deleting dependent objects when using generic MASK filtering:
  • If you specify a base CLUSTER mask pattern, the command will delete all associated AIXs and PATHs. Any subsequent AIX® or PATH specification via MASK will result in a CC=8 not found because the objects have already been deleted.
  • If you specify an AIX mask pattern on your DELETE, it will delete all PATHs associated between this AIX and its base CLUSTER. Any subsequent PATH specified in a generic delete results in a CC=8 because the PATH has been deleted already.
  • When deleting objects with dependent objects, consider the sequence of DELETE commands carefully.
Based on these considerations, we recommend the following:
  • To DELETE all CLUSTER objects, restrict the MASK pattern to CLUSTER objects, which deletes all associated AIX and PATH objects as well.
  • If you want to DELETE just the PATH objects, restrict the MASK pattern to the PATH subtype. Any subsequent AIX or CLUSTER MASK DELETE will then successfully delete AIX and CLUSTER objects.
  • To DELETE AIXs after deleting PATH objects, restrict the MASK pattern to the AIX subtype.
Parent topic: Using DELETE with the MASK Filter Option